Substrate temperature for physical vapor deposition coating

Last modified; May 5, 2010

This parameter has a considerable influence on the adhesion and microstructure, and therefore, the final optical properties of the thin film. Most thin films tend to form amorphous surfaces, but high substrate temperatures often crystallize the thin film and some substrates may even tend crystallize the film because of their intrinsic characteristics.

In practice, a substrate temperature of approximately 300KC (depending on the material used) is often used during deposition. However, substrates such as PC and PMMA cannot endure such temperatures, and so, several other techniques have been developed for depositing at low substrate temperatures, for example, IAD, which uses ions to bombard the evaporation materials.