Evaporation source: Electron beam or Resistive heating

Last modified; May 5, 2010

Materials with high melting points can be evaporated by an e-beam, but others are compatible with both e-beams and resistive heating. The method used for sweeping the e-beam spot, as well as the spot size, accelerating voltage, and emission of the e-beam, must be optimized for producing high-quality thin films.